Dynamic behavior of hydrogen in silicon nitride and oxynitride films made by low-pressure chemical vapor deposition
Phys Rev B Condens Matter
.
1993 Aug 15;48(8):5444-5456.
doi: 10.1103/physrevb.48.5444.
Authors
WM Arnoldbik
,
CH Marée
,
AJ Maas
,
van den Boogaard MJ
,
FH Habraken
,
AE Kuiper
PMID:
10009063
DOI:
10.1103/physrevb.48.5444
No abstract available