Phosphine oxide monolayers on SiO2 surfaces
Angew Chem Int Ed Engl
.
2008;47(23):4440-2.
doi: 10.1002/anie.200800737.
Authors
Roie Yerushalmi
1
,
Johnny C Ho
,
Zhiyong Fan
,
Ali Javey
Affiliation
1
Department of Electrical Engineering and Computer Sciences, University of California at Berkeley, and Materials Science Division, Lawrence Berkeley National Laboratory, University of California at Berkeley, Berkeley, CA 94720, USA.
PMID:
18461577
DOI:
10.1002/anie.200800737
No abstract available