Photoinduced nitric oxide release from a hindered nitrobenzene derivative by two-photon excitation

Kazuhiro Hishikawa; Hidehiko Nakagawa; Toshiaki Furuta; Kiyoshi Fukuhara; Hiroki Tsumoto; Takayoshi Suzuki; Naoki Miyata

doi:10.1021/ja8093668

Photoinduced nitric oxide release from a hindered nitrobenzene derivative by two-photon excitation

J Am Chem Soc. 2009 Jun 10;131(22):7488-9. doi: 10.1021/ja8093668.

Authors

Kazuhiro Hishikawa¹, Hidehiko Nakagawa, Toshiaki Furuta, Kiyoshi Fukuhara, Hiroki Tsumoto, Takayoshi Suzuki, Naoki Miyata

Affiliation

¹ Graduate School of Pharmaceutical Sciences, Nagoya City University, 3-1 Tanabe-dori Mizuho-ku, Nagoya, Aichi 467-8603, Japan.

PMID: 19438241
DOI: 10.1021/ja8093668

Abstract

Here, we demonstrated photoinduced NO generation from a 2,6-dimethylnitrobenzene-based compound (Flu-DNB) via a two-photon excitation (TPE) process. After pulse laser irradiation to a solution of Flu-DNB, oxidation products of NO were observed. This is the first account of a non-nitrosyl-chelated metal ion containing NO donor which can be controlled by the TPE technique.

Publication types

Research Support, Non-U.S. Gov't

MeSH terms

Electron Spin Resonance Spectroscopy
Fluoresceins / chemistry
Magnetic Resonance Spectroscopy
Mass Spectrometry
Nitric Oxide / chemistry*
Nitrobenzenes / chemistry*
Photochemical Processes
Photons

Substances

Fluoresceins
Nitrobenzenes
Nitric Oxide