In this paper, a dual-nozzle spin casting method was proposed to form a thin film of individualized single-walled carbon nanotubes (SWNTs) at the wafer scale. Each nozzle simultaneously ejected the SWNT solution and methanol, respectively. During the ejection process, two solutions were mixed at the contacting end of the nozzles and then dropped onto the substrate. Functionalization of the wafer substrate with the amine group improved the uniformity of the SWNT thin film as well as the adhesion between the individualized SWNTs and the substrate. The best condition of the spin casting involved the substrate functionalization using 3-aminopropyltriethosilane aqueous solution with a concentration of approximately 10 mM and a deposition velocity of approximately 5000 rpm. The root-mean-square roughness of the fabricated SWNT layer over the wafer substrate was found to be 1.4-1.8 nm, which indicated that the resultant thin film was one or two layers of SWNTs. The wafer scale SWNT thin film formed by dual-nozzle spin casting can be further used for the mass production and high integration of the SWNT nanoelectronic devices.