Block copolymer nanolithography: translation of molecular level control to nanoscale patterns

Adv Mater. 2009 Dec 18;21(47):4769-92. doi: 10.1002/adma.200803302.

Abstract

The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.