Photostabilization of functional polymeric materials is important for protection against aging and ultraviolet (UV) irradiation. There is, therefore, the impetus to modify polymers to increase their resistance to photodegradation and photooxidation on extended exposure to UV light in harsh conditions. Various polymeric additives have been designed and synthesized in recent years, and their potential as photostabilizers has been explored. Reported here is the effect of pendant functionalization of poly(methyl methacrylate) (PMMA) through organometallic moiety incorporation into the polymer's backbone. The reaction of PMMA with ethylenediamine leads to the formation of an amino residue that can react with salicylaldehyde to produce the corresponding Schiff base. Adding metal chlorides (zinc, copper, nickel, and cobalt) led to the formation of organometallic residues on the polymeric chains. Thin films of modified and unmodified PMMA were produced and irradiated with UV light to determine the effect of pendant modification on photostability. The photostabilization of PMMA was assessed using a range of methods, including infrared spectroscopy, weight loss, decomposition rate constant, and surface morphology. The modified PMMA incorporating organic Schiff base metal complexes showed less photodecomposition than the unmodified polymer or one containing the Schiff base only. Thus, the metals significantly reduced the photodegradation of polymeric materials. The polymer containing the Schiff base-cobalt unit showed the least damage in the PMMA surface due to photoirradiation, followed by those containing nickel, zinc, and copper, in that order.
Keywords: decomposition rate constant; poly(methyl methacrylate); polymeric material pendant modification; radicals scavenger; surface morphology; ultraviolet irradiation; weight loss.