Graphene-based materials are ideal for electromagnetic wave-absorbing materials (EAMs) due to their strong electrical and dielectric losses with reduced thickness and weight. To enhance the electromagnetic wave absorption performance of these materials, additional components are often incorporated. However, this approach not only increases the complexity of the synthesis process but also complicates and destabilizes the control of the material properties. In this study, we successfully employed a one-step method to reduce graphene oxide and transform 2D graphene into a 3D pocket-like structure through plasma treatment. This unique 3D structure is induced by the formation of uneven defects on the surface due to plasma treatment. The distinctive pouch-like structure of the reduced graphene oxide achieved remarkable electromagnetic wave absorption properties. Specifically, the material demonstrated a minimum reflection loss of -38.65 dB at 7.14 GHz, with an effective absorption bandwidth of 5.13 GHz and a thickness of just 1.9 mm. These results highlight the potential of plasma processing as a rapid, efficient, and environmentally friendly approach for the continuous production of advanced EAMs, paving the way for greener manufacturing practices in the industry.
Keywords: defect; electromagnetic absorption; pouch-like structure; radio frequency plasma; reduced graphene oxide.