Since surface relief transmission gratings have very strict requirements on operators and use environment, according to the semiconductor laser external cavity spectral beam combining system, this paper proposes a design scheme for a semiconductor laser array spectral beam combining system based on the grating-external cavity. The finite element approach was used to create a wideband, high-efficiency fill-in multilayer dielectric transmission grating structure for a high-power spectrum beam combining system. The incidence angle, ridge height, duty cycle, and sidewall inclination angle of the transmission grating were tuned and evaluated, and a link between the transmission grating's diffraction efficiency and grating characteristics was discovered. The calculated design of the high-power fused silica transmission grating has a negative first-order peak diffraction efficiency of 99.5% in the 800 nm range. In the spectral region of 765-872 nm, the transmission grating's diffraction effectiveness exceeds 92%. The filled ultra-high diffraction efficiency multilayer dielectric transmission grating design addresses the issue of resistance to high-power lasers under complicated operating settings. It is intended to maintain a high diffraction efficiency even after several cleaning cycles, and it is an ideal component for high-power spectrum beam combining systems.
Keywords: fabrication tolerance; multilayer dielectric; near-infrared; transmission grating.