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Page 1
Structure investigations of nonpolar GaN layers.
Neumann W, Mogilatenko A, Wernicke T, Richter E, Weyers M, Kneissl M. Neumann W, et al. Among authors: weyers m. J Microsc. 2010 Mar;237(3):308-13. doi: 10.1111/j.1365-2818.2009.03249.x. J Microsc. 2010. PMID: 20500386
Skin tolerant inactivation of multiresistant pathogens using far-UVC LEDs.
Glaab J, Lobo-Ploch N, Cho HK, Filler T, Gundlach H, Guttmann M, Hagedorn S, Lohan SB, Mehnke F, Schleusener J, Sicher C, Sulmoni L, Wernicke T, Wittenbecher L, Woggon U, Zwicker P, Kramer A, Meinke MC, Kneissl M, Weyers M, Winterwerber U, Einfeldt S. Glaab J, et al. Among authors: weyers m. Sci Rep. 2021 Jul 19;11(1):14647. doi: 10.1038/s41598-021-94070-2. Sci Rep. 2021. PMID: 34282225 Free PMC article.
Author Correction: Skin tolerant inactivation of multiresistant pathogens using far-UVC LEDs.
Glaab J, Lobo-Ploch N, Cho HK, Filler T, Gundlach H, Guttmann M, Hagedorn S, Lohan SB, Mehnke F, Schleusener J, Sicher C, Sulmoni L, Wernicke T, Wittenbecher L, Woggon U, Zwicker P, Kramer A, Meinke MC, Kneissl M, Weyers M, Winterwerber U, Einfeldt S. Glaab J, et al. Among authors: weyers m. Sci Rep. 2022 May 11;12(1):7702. doi: 10.1038/s41598-022-11796-3. Sci Rep. 2022. PMID: 35545652 Free PMC article. No abstract available.
Displacement Talbot lithography for nano-engineering of III-nitride materials.
Coulon PM, Damilano B, Alloing B, Chausse P, Walde S, Enslin J, Armstrong R, Vézian S, Hagedorn S, Wernicke T, Massies J, Zúñiga-Pérez J, Weyers M, Kneissl M, Shields PA. Coulon PM, et al. Among authors: weyers m. Microsyst Nanoeng. 2019 Dec 2;5:52. doi: 10.1038/s41378-019-0101-2. eCollection 2019. Microsyst Nanoeng. 2019. PMID: 31814992 Free PMC article.
34 results