Jeong SJ - Search Results

1

Flexible and transferrable self-assembled nanopatterning on chemically modified graphene.

Kim JY, Kim BH, Hwang JO, Jeong SJ, Shin DO, Mun JH, Choi YJ, Jin HM, Kim SO. Kim JY, et al. Among authors: jeong sj. Adv Mater. 2013 Mar 6;25(9):1331-5. doi: 10.1002/adma.201204131. Epub 2012 Dec 13. Adv Mater. 2013. PMID: 23239284 No abstract available.

2

3D Tailored Crumpling of Block-Copolymer Lithography on Chemically Modified Graphene.

Kim JY, Lim J, Jin HM, Kim BH, Jeong SJ, Choi DS, Li DJ, Kim SO. Kim JY, et al. Among authors: jeong sj. Adv Mater. 2016 Feb 24;28(8):1591-6. doi: 10.1002/adma.201504590. Epub 2015 Dec 14. Adv Mater. 2016. PMID: 26660004

3

Flash Light Millisecond Self-Assembly of High χ Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning.

Jin HM, Park DY, Jeong SJ, Lee GY, Kim JY, Mun JH, Cha SK, Lim J, Kim JS, Kim KH, Lee KJ, Kim SO. Jin HM, et al. Among authors: jeong sj. Adv Mater. 2017 Aug;29(32). doi: 10.1002/adma.201700595. Epub 2017 Jun 21. Adv Mater. 2017. PMID: 28635174

4

Surface energy modification by spin-cast, large-area graphene film for block copolymer lithography.

Kim BH, Kim JY, Jeong SJ, Hwang JO, Lee DH, Shin DO, Choi SY, Kim SO. Kim BH, et al. Among authors: jeong sj. ACS Nano. 2010 Sep 28;4(9):5464-70. doi: 10.1021/nn101491g. ACS Nano. 2010. PMID: 20738125

5

Complex High-Aspect-Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self-Assembly.

Jeon HJ, Kim JY, Jung WB, Jeong HS, Kim YH, Shin DO, Jeong SJ, Shin J, Kim SO, Jung HT. Jeon HJ, et al. Among authors: jeong sj, jeong hs. Adv Mater. 2016 Oct;28(38):8439-8445. doi: 10.1002/adma.201602523. Epub 2016 Aug 4. Adv Mater. 2016. PMID: 27488974

6

Spin coating nanopatterned multielemental materials via self-assembled nanotemplates.

Xia G, Jeong SJ, Kim JE, Kim BH, Koo CM, Kim SO. Xia G, et al. Among authors: jeong sj. Nanotechnology. 2009 Jun 3;20(22):225301. doi: 10.1088/0957-4484/20/22/225301. Epub 2009 May 12. Nanotechnology. 2009. PMID: 19433872

7

One-dimensional metal nanowire assembly via block copolymer soft graphoepitaxy.

Jeong SJ, Moon HS, Shin J, Kim BH, Shin DO, Kim JY, Lee YH, Kim JU, Kim SO. Jeong SJ, et al. Nano Lett. 2010 Sep 8;10(9):3500-5. doi: 10.1021/nl101637f. Nano Lett. 2010. PMID: 20677800

8

Ultralarge-area block copolymer lithography enabled by disposable photoresist prepatterning.

Jeong SJ, Moon HS, Kim BH, Kim JY, Yu J, Lee S, Lee MG, Choi H, Kim SO. Jeong SJ, et al. ACS Nano. 2010 Sep 28;4(9):5181-6. doi: 10.1021/nn101212q. ACS Nano. 2010. PMID: 20722433

9

Negative-tone block copolymer lithography by in situ surface chemical modification.

Kim BH, Byeon KJ, Kim JY, Kim J, Jin HM, Cho JY, Jeong SJ, Shin J, Lee H, Kim SO. Kim BH, et al. Among authors: jeong sj. Small. 2014 Oct 29;10(20):4207-12. doi: 10.1002/smll.201400971. Epub 2014 Jun 10. Small. 2014. PMID: 24912807

10

Self-Assembly of Complex Multimetal Nanostructures from Perforated Lamellar Block Copolymer Thin Films.

Cha SK, Lee GY, Mun JH, Jin HM, Moon CY, Kim JS, Kim KH, Jeong SJ, Kim SO. Cha SK, et al. Among authors: jeong sj. ACS Appl Mater Interfaces. 2017 May 10;9(18):15727-15732. doi: 10.1021/acsami.7b03319. Epub 2017 Apr 26. ACS Appl Mater Interfaces. 2017. PMID: 28401753

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