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Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study.
Beladiya V , Becker M , Faraz T , Kessels WMME , Schenk P , Otto F , Fritz T , Gruenewald M , Helbing C , Jandt KD , Tünnermann A , Sierka M , Szeghalmi A . Beladiya V , et al. Among authors: gruenewald m. Nanoscale. 2020 Jan 23;12(3):2089-2102. doi: 10.1039/c9nr07202k. Nanoscale. 2020. PMID: 31912855
Atomically Thin Metal-Dielectric Heterostructures by Atomic Layer Deposition.
Paul P, Schmitt P, Sigurjónsdóttir VV, Hanemann K, Felde N, Schröder S, Otto F, Gruenewald M, Fritz T, Roddatis V, Tünnermann A, Szeghalmi A. Paul P, et al. Among authors: gruenewald m. ACS Appl Mater Interfaces. 2023 May 10;15(18):22626-22636. doi: 10.1021/acsami.2c22590. Epub 2023 Apr 25. ACS Appl Mater Interfaces. 2023. PMID: 37097287
106 results