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Electrostatic Screening of Charged Defects in Monolayer MoS2.
Atallah TL, Wang J, Bosch M, Seo D, Burke RA, Moneer O, Zhu J, Theibault M, Brus LE, Hone J, Zhu XY. Atallah TL, et al. Among authors: wang j. J Phys Chem Lett. 2017 May 18;8(10):2148-2152. doi: 10.1021/acs.jpclett.7b00710. Epub 2017 Apr 28. J Phys Chem Lett. 2017. PMID: 28448150
Approaching the Intrinsic Limit in Transition Metal Diselenides via Point Defect Control.
Edelberg D, Rhodes D, Kerelsky A, Kim B, Wang J, Zangiabadi A, Kim C, Abhinandan A, Ardelean J, Scully M, Scullion D, Embon L, Zu R, Santos EJG, Balicas L, Marianetti C, Barmak K, Zhu X, Hone J, Pasupathy AN. Edelberg D, et al. Among authors: wang j. Nano Lett. 2019 Jul 10;19(7):4371-4379. doi: 10.1021/acs.nanolett.9b00985. Epub 2019 Jun 10. Nano Lett. 2019. PMID: 31180688
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