Selective Digital Etching of Silicon-Germanium Using Nitric and Hydrofluoric Acids.
Li C, Zhu H, Zhang Y, Yin X, Jia K, Li J, Wang G, Kong Z, Du A, Yang T, Zhao L, Huang W, Xie L, Li Y, Ai X, Ma S, Radamson HH.
Li C, et al. Among authors: xie l.
ACS Appl Mater Interfaces. 2020 Oct 21;12(42):48170-48178. doi: 10.1021/acsami.0c14018. Epub 2020 Oct 9.
ACS Appl Mater Interfaces. 2020.
PMID: 32970945