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Clamping enables enhanced electromechanical responses in antiferroelectric thin films.
Pan H, Zhu M, Banyas E, Alaerts L, Acharya M, Zhang H, Kim J, Chen X, Huang X, Xu M, Harris I, Tian Z, Ricci F, Hanrahan B, Spanier JE, Hautier G, LeBeau JM, Neaton JB, Martin LW. Pan H, et al. Among authors: xu m. Nat Mater. 2024 Jul;23(7):944-950. doi: 10.1038/s41563-024-01907-y. Epub 2024 May 23. Nat Mater. 2024. PMID: 38783106
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