Scalable CMOS back-end-of-line-compatible AlScN/two-dimensional channel ferroelectric field-effect transistors.
Kim KH, Oh S, Fiagbenu MMA, Zheng J, Musavigharavi P, Kumar P, Trainor N, Aljarb A, Wan Y, Kim HM, Katti K, Song S, Kim G, Tang Z, Fu JH, Hakami M, Tung V, Redwing JM, Stach EA, Olsson RH 3rd, Jariwala D.
Kim KH, et al. Among authors: kim g, kim hm.
Nat Nanotechnol. 2023 Sep;18(9):1044-1050. doi: 10.1038/s41565-023-01399-y. Epub 2023 May 22.
Nat Nanotechnol. 2023.
PMID: 37217764